Controlled temperature purification of aqueous sodium hydroxide

Details Controlled temperature purification of aqueous sodium hydroxide Controlled temperature purification of aqueous sodium hydroxide

1979-06-13

1981-02-17

Vertiz, O. R.

Chemistry of inorganic compounds

Treating mixture to obtain metal containing compound

Alkali metal

210774, 210806, 2102212, C01D 104

Patent

active

042514908

ABSTRACT:
Methods and apparatus are disclosed for enhanced purification of caustic soda solutions. In place of conventional mechanical separators, flotation separation methods are taught utilizing sequential multi-temperature sparging gas treatments. A first stage treatment, at about 70.degree. F.-90.degree. F., provides separation of sodium chloride and a subsequent stage, higher temperature (about 90.degree. F.-100.degree. F.) treatment provides enhanced removal of suspended sodium sulfate. Sensible heat is added to sparging gas to offset the cooling effect of gas expansion in a treatment tank and avoid crystallization of dissolved impurities from saturated solutions on sparging gas nozzles.

REFERENCES:
patent: 2127496 (1938-08-01), Waldeck
patent: 2178694 (1939-11-01), Muskat et al.
patent: 2699377 (1955-01-01), Dancy et al.
patent: 2780360 (1957-02-01), Bon et al.
patent: 2920763 (1960-01-01), Lind et al.
patent: 3015396 (1962-01-01), Quast
patent: 3390076 (1968-06-01), Dubach
patent: 3446353 (1969-05-01), Davis
patent: 3448044 (1969-06-01), Garrett
patent: 3799749 (1974-03-01), Moyer et al.
patent: 4065270 (1977-12-01), Nakaya et al.

Affiliated with

Also associated with

Rating

Controlled temperature purification of aqueous sodium hydroxide does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Controlled temperature purification of aqueous sodium hydroxide , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Controlled temperature purification of aqueous sodium hydroxide will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2262155