Controlled tapered angle etching process for fabricating optical

Details Controlled tapered angle etching process for fabricating optical Controlled tapered angle etching process for fabricating optical

1993-10-08

1995-12-05

Lee, John D.

Optical waveguides

Integrated optical circuit

385 43, 385129, G02B 612

Patent

active

054737109

ABSTRACT:
The present invention discloses an OIC fabrication system which includes a tapered angle computing means for computing a tapered angle for aching a required coupling efficiency. The fabrication system also includes a fabrication control means which includes a tabulated fabricating parameter database for determining and controlling a plurality of fabricating parameters. The fabrication system also includes an etching system which receives a plurality of control signals from the fabrication controlling means to carry out the etching process to form a tapered etching angle such that the optical coupling efficiency can be achieved.

REFERENCES:
patent: 3610727 (1971-10-01), Ulrich
patent: 3948583 (1976-04-01), Tien
patent: 4672382 (1988-08-01), Husain et al.
patent: 4772787 (1988-09-01), Trommer
patent: 5006906 (1991-04-01), Deri
patent: 5173955 (1992-12-01), Yamanishi et al.

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