Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2006-04-26
2009-06-09
Chen, Bret (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
43, C117S084000, C117S108000
Reexamination Certificate
active
07544398
ABSTRACT:
The invention relates to methods for producing doped thin layers on substrates comprising the steps of depositing a dopant precursor on the substrate via an atomic layer deposition technique; and exposing the deposited dopant precursor to radicals. The methods can further comprise depositing a compound adjacent the dopant metal via an atomic layer deposition technique; and exposing the deposited compound to radicals, thereby providing a host. The invention relates to articles comprising approximately atomically thin layers of metals or metal oxides doped with at least one different metal or metal oxide. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
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Chang Jane P.
Chiang Tony
Deshpandey Chandra
Lesser Karl
Van Trinh Tu
Ballard Spahr Andrews & Ingersoll LLP
Chen Bret
The Regents of the Univesity of California
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