Controlled flow vaporizer

Details Controlled flow vaporizer Controlled flow vaporizer

1987-07-15

1989-07-11

Walberg, Teresa J.

Electric heating

Heating devices

Resistive element: igniter type

219305, 219275, H05B 358, F22B 128

Patent

active

048474690

ABSTRACT:
A vaporizing apparatus delivers precisely controlled, substantially continuous and monitored vapor flows for uses such as in plasma enhanced vapor deposition. The vaporizing apparatus includes a fluid passageway along which are a pumping device, a vaporizing device, and a flowing device, all in fluid communication with the passageway. The vaporizing device vaporizes liquid pumped from the pumping device and includes a heat sink layer, a heated layer, and a portion of the passageway sandwiched therebetween. The vaporizing apparatus can sustain a flow of organosilicon vapor at a flow rate of about 1 to about 100 SCCM for as long as desired.

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