Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – For crystallization from liquid or supercritical state
Patent
1995-11-13
1996-12-24
Nguyen, Nam
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
For crystallization from liquid or supercritical state
117208, 117217, C30B 3500
Patent
active
055870163
ABSTRACT:
A source (1) is equipped with a conveying device (4) for discharging the particles (2, 2a) at adjustable rates per unit time. A crystal (16), formed from doped particles, is withdrawn from the melting crucible (13) at a predetermined rate per unit time. So that the control process can be conducted smoothly over prolonged periods of time with precise doping, the particles (2, 2a) are fed single file to the melting crucible (13) and counted by at least one sensor (21, 22). The sequence of count pulses is sent to a counter (25) and compared there with a corresponding sequence of reference input pulses. The comparison signal formed from the count pulses and the reference input pulses is used, in accordance with its sign, as a control signal for adjusting the amount of particles being discharged per unit time from source (1) to correspond to the reference value.
REFERENCES:
patent: 3998686 (1976-12-01), Meiling et al.
patent: 4036595 (1977-07-01), Lorenzini et al.
patent: 4547258 (1985-10-01), Witter et al.
patent: 4968380 (1990-11-01), Freedman et al.
patent: 5229082 (1993-07-01), Seidensticker et al.
patent: 5324488 (1994-06-01), Klingshirn et al.
Altekruger Burkhard
Aufreiter Joachim
Bruss Dieter
Kalkowski Klaus
Garrett Felisa
Leybold Aktiengesellschaft
Nguyen Nam
LandOfFree
Controlled feeding Czochralski apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Controlled feeding Czochralski apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Controlled feeding Czochralski apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1176252