Controlled environment for diffusion furnace

Details Controlled environment for diffusion furnace Controlled environment for diffusion furnace

1982-05-10

1984-03-13

Camby, J.

Heating

Accessory means for holding, shielding or supporting work...

118729, 432239, F27D 500

Patent

active

044365098

ABSTRACT:
A movable control or reception chamber is provided at the loading-unloading chamber of a diffusion furnace to control the environment around the wafers both before and after the wafers are removed from processing in the furnace tube. The reception chamber is capable of controlling the heat-up temperature prior to insertion of the wafers into the furnace while during the cool-down phase the heat given off is both controlled and prevented from being dissipated into the room.

REFERENCES:
patent: 4129090 (1978-12-01), Inaniwa et al.
patent: 4256052 (1981-03-01), Johnson et al.
patent: 4351805 (1982-09-01), Reisman et al.
Pp. 91 and 92 of IBM Technical Disclosure Bulletin, by C. E. Benjamin, vol. 9, No. 1, Jun. 1966.
P. 1686 of IBM Technical Disclosure Bulletin, by R. M. DeFries, vol. 11, No. 12, May 1969.

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