X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1993-03-30
1995-02-14
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 79, G01N 2320
Patent
active
053902300
ABSTRACT:
A sample holder for diffraction analysis protects air or moisture sensitive samples and accommodates samples of different sizes, both without contributing to background noise. In particular, a sample holder for beam diffractometery includes a holder body having a substantially flat beam-facing top surface and a through-hole extending through the top surface, a piston fitted in the through-hole so as to travel along an axis of the through-hole, and a cup-shaped cap fitted over at least a portion of the top surface, surrounding the through-hole. To minimize background noise, the top surface of the holder body and a top surface of the piston are made of quartz. For sample loading, a substantially flat plate and a mechanism for removably attaching the plate so as to overlie the top surface of the holder body are provided. The cap may be made of thin plastic so as to not affect the incident X-ray beam.
REFERENCES:
patent: 5084910 (1992-01-01), Albe et al.
patent: 5181233 (1993-01-01), Rink et al.
Church Craig E.
LaPaglia S. Russell
Valence Technology Inc.
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