Controllable isotropic plasma etching technique for the suppress

Details Controllable isotropic plasma etching technique for the suppress Controllable isotropic plasma etching technique for the suppress

1993-03-08

1994-08-30

Thomas, Tom

Fishing, trapping, and vermin destroying

437 43, 437 48, 437233, 156643, H01L 2170

Patent

active

053428013

ABSTRACT:
In the manufacture of memory cells, horizontal etching is controlled in a manner which prevents the formation of stringers between adjacent cells without undercutting the sidewalls of a memory cell.

REFERENCES:
patent: 4490209 (1984-12-01), Hartman
patent: 4799991 (1989-01-01), Dockrey
patent: 4808259 (1989-02-01), Jillie et al.
patent: 5149665 (1992-09-01), Lee
patent: 5158902 (1992-10-01), Hamada
patent: 5242536 (1993-09-01), Schoemborn

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