Control system for the czochralski process

Details Control system for the czochralski process Control system for the czochralski process

1987-07-13

1989-08-15

Stoll, Robert L.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including specific material of construction

422106, 422109, 422114, 156601, 1566171, C03B 1526

Patent

active

048572780

ABSTRACT:
The control system includes a master loop for controlling crystal interface diameter and slave control loops for controlling the melt and the crystal thermal environment. Diameter and meniscus angle signals are partitioned into both a low frequency and a high frequency signal. The low frequency signal is used to adjust the set point of the melt. The higher frequency signal is used to control the crystal pull rate. The crystal control slave loop regulates crystal heat flux which may include following a heat flux trajectory. The heat flux trajectory may also be used to adjust the melt temperature set point.

REFERENCES:
patent: 3206286 (1965-09-01), Bennett et al.
patent: 3291650 (1966-12-01), Dohmen et al.
patent: 3692499 (1972-09-01), Andrychuk
patent: 3998598 (1976-12-01), Bonora
patent: 4058429 (1977-11-01), Duncan et al.
patent: 4565598 (1986-01-01), Seymour
patent: 4617173 (1986-10-01), Latka
Hurle, Control Of Diameter In Czochralski And Related Crystal Growth Techniques, Journal of Crystal Growth, 42 (1977) pp. 473-482.
J. M. Quenisset et al., "Automation of a Vertical Zone Melting Apparatus" Journal of Crystal Growth 30 (1975) 169-176. (English Translation).
D. T. Hurle, J. Cry, Growth, 85 (1987) 1.
C. E. Garcia and M. Morari, I&EC Proc. Des. Dev., 21(1982)308.
G. Stephanopoulos and H-P Huang, "The 2-Port Control System", 1986.
G. Stein and M. Athans, LIDS-P-1384, MIT (1984).
W. Bardsley et al., J. Cry. Growth, 40(1977)13, 40(1977)21.
U. Gross and R. Kersten, J. Cry. Growth, 15(1972)85.
K. J. Gartner et al., J. Cry. Growth, 13/14(1972)619.
S. Ozawa and T. Fukuda, J. Cry. Growth, 76(1986)323.
T. G. Digges Jr. et al., J. Cry. Growth, 29(1975)326.
Kaytex-Hamco Co., CG3000 Crystal Growing System Manual.
S. Motakef, ASME J of Heat Transfer, submitted 1987.
U. Ekhult and T. Carlberg, J. Cry. Growth, 76(1986)317.
A. S. Jordan et al., J. Cry. Growth, 70(1984)555.
A. G. Elliot et al., J. Cry. Growth, 70(1984) 169.
Crystal Res. Technol., 21 9 1986, p. 1125.
J. Cry. Growth, 65 1983, p. 278.
J. Cry. Growth, 10 1971, p. 133.
J. Cry. Growth, 76 1986, p. 395, 75 1986, p. 227.
D. F. O'Kane et al., J. Cry. Growth, 13/14 (1972) 624.

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