Control system for supplying a gas flow to a gas consumption

Fluid handling – Self-proportioning or correlating systems – Mixture condition maintaining or sensing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

137487, 1374875, 251905, G05D 706

Patent

active

053886070

ABSTRACT:
A control system for supplying a gas flow to a gas consumption apparatus, comprising a gas supply pipe which can be connected to the apparatus and which has an electrically controlled gas control valve, and an electronic control unit. The control unit comprises a mathematical module, model-related to the control valve, for adjusting the valve position, and the gas control valve has in-built sensors for gas variables and valve position, the control system adjusting the control valve in linear proportion to a desired gas-flow signal to be supplied to the control unit. The mathematical module comprises a flow submodule, a mechanical submodule and a valve-position submodule, and the flow submodule receives, at its inputs, the desired gas-flow signal and gas variables originating from the valve sensors and supplies, at its output, a signal relating to the through-flow area of the valve, to the mechanical submodule. Said mechanical submodule contains mechanical valve parameters processed therein and supplies, at its output, a valve-position signal to the valve-position submodule, which receives a position signal originating from the valve-position sensor. The valve sensors for the gas variables comprise a sensor for the gas inlet pressure, a sensor for the gas inlet temperature and a sensor for the gas pressure difference across the valve. The gas control valve is designed as a cylindrical hollow slide valve having central gas feed and lateral gas outlet with exponential flow profile, and is provided with an electromagnetic actuator having a wire coil wound on the valve slide in a permanent magnetic field.

REFERENCES:
patent: 4146051 (1979-03-01), Sparks
patent: 4277832 (1981-07-01), Wong
patent: 4545009 (1985-10-01), Muraki et al.
patent: 4796651 (1989-01-01), Ginn et al.
patent: 5129418 (1992-07-01), Shimomura et al.
patent: 5146941 (1992-09-01), Statler

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Control system for supplying a gas flow to a gas consumption does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Control system for supplying a gas flow to a gas consumption, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Control system for supplying a gas flow to a gas consumption will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-281615

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.