Control system for a two chamber gas discharge laser

Details Control system for a two chamber gas discharge laser Control system for a two chamber gas discharge laser

2006-05-02

2006-05-02

Wong, Don (Department: 2821)

Coherent light generators

Particular active media

Gas

C372S057000

Reexamination Certificate

active

07039086

ABSTRACT:
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2injection controls with novel learning algorithm.

REFERENCES:
patent: 4223279 (1980-09-01), Bradford, Jr. et al.
patent: 4410992 (1983-10-01), Javan
patent: 4455658 (1984-06-01), Sutter et al.
patent: 4959840 (1990-09-01), Akins et al.
patent: 5023884 (1991-06-01), Akins et al.
patent: 5025445 (1991-06-01), Anderson et al.
patent: 5025446 (1991-06-01), Kuizenga
patent: 5189678 (1993-02-01), Ball et al.
patent: 5313481 (1994-05-01), Cook et al.
patent: 5315611 (1994-05-01), Ball et al.
patent: 5359620 (1994-10-01), Akins
patent: 5416391 (1995-05-01), Correa et al.
patent: 5448580 (1995-09-01), Birx et al.
patent: 5471965 (1995-12-01), Kapich
patent: 5771258 (1998-06-01), Morton et al.
patent: 5852621 (1998-12-01), Sandstrom
patent: 5863017 (1999-01-01), Larson et al.
patent: 5953360 (1999-09-01), Vitruk et al.
patent: 5978394 (1999-11-01), Newman et al.
patent: 5982800 (1999-11-01), Ishihara et al.
patent: 5991324 (1999-11-01), Knowles et al.
patent: 6005879 (1999-12-01), Sandstrom et al.
patent: 6014398 (2000-01-01), Hofmann et al.
patent: 6016325 (2000-01-01), Ness et al.
patent: 6018537 (2000-01-01), Hofmann et al.
patent: 6028880 (2000-02-01), Carlesi et al.
patent: 6067311 (2000-05-01), Morton et al.
patent: 6094448 (2000-07-01), Fomenkov et al.
patent: 6104735 (2000-08-01), Webb
patent: 6128323 (2000-10-01), Myers et al.
patent: 6151349 (2000-11-01), Gong et al.
patent: 6164116 (2000-12-01), Rice et al.
patent: 6188710 (2001-02-01), Besaucele et al.
patent: 6192064 (2001-02-01), Algots et al.
patent: 6208674 (2001-03-01), Webb et al.
patent: 6208675 (2001-03-01), Webb
patent: 6212211 (2001-04-01), Azzola et al.
patent: 6219368 (2001-04-01), Govorkov
patent: 6240117 (2001-05-01), Gong et al.
patent: 6314119 (2001-11-01), Morton
patent: 6317447 (2001-11-01), Partlo et al.
patent: 6330261 (2001-12-01), Ishihara et al.
patent: 6359922 (2002-03-01), Partlo et al.
patent: 6396856 (2002-05-01), Sucha et al.
patent: 6414979 (2002-07-01), Ujazdowski et al.
patent: 6466365 (2002-10-01), Maier et al.
patent: 6477193 (2002-11-01), Oliver et al.
patent: 6535531 (2003-03-01), Smith et al.
patent: 6538737 (2003-03-01), Sandstrom et al.
patent: 6625191 (2003-09-01), Knowles et al.
patent: 6671294 (2003-12-01), Kroyan et al.
patent: 6687562 (2004-02-01), Patel et al.
patent: 6721340 (2004-04-01), Fomenkov et al.
patent: 6750972 (2004-06-01), Sandstrom et al.
patent: 6757316 (2004-06-01), Newman et al.
patent: 2002/0105994 (2002-08-01), Partlo et al.
patent: 2002/0167975 (2002-11-01), Spangler et al.
patent: 2003/0118072 (2003-06-01), Wittak et al.
Burnett, Levine, Shirley & Bruning, “Symmetry of spatial-dispersion-induced birefringence and its implications of CaF2ultraviolet optics,” J. Microlith, Microsyst., vol. 1, No. 3, Oct. 2002.

Affiliated with

Also associated with

Rating

Control system for a two chamber gas discharge laser does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Control system for a two chamber gas discharge laser, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Control system for a two chamber gas discharge laser will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3562969