Control system for a sputtering system

Electricity: single generator systems – Generator control – Combined diverse generator controls

Reexamination Certificate

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Details

C322S019000, C322S020000, C322S022000, C322S036000, C322S037000

Reexamination Certificate

active

06995545

ABSTRACT:
A fault handling algorithm processes a plurality of fault status signals from a sputtering system in a period of time to generate at least one command signal for affecting the operation of a power generator.

REFERENCES:
patent: 3569777 (1971-03-01), Beaudry
patent: 3757733 (1973-09-01), Reinberg
patent: 3824624 (1974-07-01), Carlson et al.
patent: 3825732 (1974-07-01), Haley et al.
patent: 3826906 (1974-07-01), Carlson et al.
patent: 3829667 (1974-08-01), Carlson et al.
patent: 3829669 (1974-08-01), Haley et al.
patent: 3832533 (1974-08-01), Carlson et al.
patent: 3832534 (1974-08-01), Carlson et al.
patent: 3833927 (1974-09-01), Carlson et al.
patent: 3857027 (1974-12-01), Carlson et al.
patent: 3863270 (1975-01-01), Haley et al.
patent: 3867216 (1975-02-01), Jacob
patent: 4115184 (1978-09-01), Poulsen
patent: 4207137 (1980-06-01), Tretola
patent: 4471399 (1984-09-01), Udren
patent: 4629940 (1986-12-01), Gagne et al.
patent: 4719551 (1988-01-01), Nishizawa et al.
patent: 4902394 (1990-02-01), Kenmotsu et al.
patent: 4990859 (1991-02-01), Bouyer et al.
patent: 4996646 (1991-02-01), Farrington
patent: 5166887 (1992-11-01), Farrington et al.
patent: 5170360 (1992-12-01), Porter et al.
patent: 5198746 (1993-03-01), Gyugyi et al.
patent: 5278773 (1994-01-01), Cousineau
patent: 5422826 (1995-06-01), Cousineau
patent: 5424691 (1995-06-01), Sadinsky
patent: 5505835 (1996-04-01), Sakaue et al.
patent: 5554809 (1996-09-01), Tobita et al.
patent: 5584974 (1996-12-01), Sellers
patent: 5616224 (1997-04-01), Boling
patent: 5645698 (1997-07-01), Okano
patent: 5651865 (1997-07-01), Sellers
patent: 5652485 (1997-07-01), Spiegel et al.
patent: 5664066 (1997-09-01), Sun et al.
patent: 5711843 (1998-01-01), Jahns
patent: 5718813 (1998-02-01), Drummond et al.
patent: 5754033 (1998-05-01), Thomson
patent: 5759424 (1998-06-01), Imatake et al.
patent: 5770023 (1998-06-01), Sellers
patent: 5796214 (1998-08-01), Nerone
patent: 5810982 (1998-09-01), Sellers
patent: 5831851 (1998-11-01), Eastburn et al.
patent: 5842154 (1998-11-01), Harnett
patent: 5844369 (1998-12-01), Yoshizako et al.
patent: 5929610 (1999-07-01), Friedlander et al.
patent: 6001224 (1999-12-01), Drummond et al.
patent: 6020794 (2000-02-01), Wilbur
patent: 6072302 (2000-06-01), Underwood et al.
patent: 6130523 (2000-10-01), Hughes et al.
patent: 6175217 (2001-01-01), Da Ponte et al.
patent: 6291999 (2001-09-01), Nishimori et al.
patent: 6316918 (2001-11-01), Underwood et al.
patent: 6358573 (2002-03-01), Raoux et al.
patent: 6380719 (2002-04-01), Underwood et al.
patent: 6383554 (2002-05-01), Chang et al.
patent: 6411065 (2002-06-01), Underwood et al.
patent: 6459067 (2002-10-01), Vona et al.
patent: 6472822 (2002-10-01), Chen et al.
patent: 6521099 (2003-02-01), Drummond et al.
patent: 6524455 (2003-02-01), Sellers
patent: 6703080 (2004-03-01), Reyzelman et al.
patent: 6738692 (2004-05-01), Schienbein et al.
patent: 6772051 (2004-08-01), Nagafuchi et al.
patent: 2003/0213559 (2003-11-01), Goodman
patent: 44 20 951 (1995-12-01), None
patent: 0 957 184 (1999-11-01), None
patent: 7-188919 (1995-07-01), None
Cobine,Gaseous Conductors, Theory and Engineering Applications, (1958) Chapter 8, “Glow Discharges,” pp. 205-289.
Chapman,Glow Discharge Processes, Sputtering and Plasma Etching, (1980) Chapter 2 “Gas Phase Collision Processes,” pp. 21-49.
Boxman et al,Handbook of Vacuum Arc Science and Technology, Fundamentals and Applications, (1995) “Foreword”, pp. vii-viii, “Preface” pp. ix-xv, and Chapter 2, “Arc Ignition,” pp. 28-72.
International Search Report for International Patent Application Serial No. PCT/US2004/026684, dated May 10, 2005 (11 pages).

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