Control of vapor deposition

Details Control of vapor deposition Control of vapor deposition

1976-09-21

1977-05-17

Kaplan, Morris

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

118 8, 118 49, 427166, C23C 1304

Patent

active

040242919

ABSTRACT:
An arrangement for regulating the vapor deposited layer build-up in the production of deposited optically active thin layers on substrates in a vacuum. The optical characteristics of the deposited layer are measured continuously and the measurements are converted into proportional electrical signals. These signals are differentiated twice, with the second derivative serving to provide the zero-axis crossings of the signals. The vapor deposition process is interrupted dependent on the zero-axis crossings.

REFERENCES:
patent: 2338234 (1944-01-01), Dimmick
patent: 2936732 (1960-05-01), Ring et al.
patent: 2978364 (1961-04-01), Blaustein
patent: 3059611 (1962-10-01), Fury et al.

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