Control of the filling level in ion cyclotron resonance mass...

Radiant energy – Ionic separation or analysis – Methods

Reexamination Certificate

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C250S281000

Reexamination Certificate

active

07495209

ABSTRACT:
The invention relates to methods and devices for regulating the filling level in measuring cells of ion cyclotron resonance mass spectrometers so that it is optimal for mass resolution and mass accuracy. The invention consists in supplying a fraction of the samples to a second reference mass spectrometer operated in parallel, and employing the mass spectra obtained from this reference mass spectrometer to regulate the filling level in the ion cyclotron resonance mass spectrometer.

REFERENCES:
patent: 4978852 (1990-12-01), Williams et al.
patent: 6600154 (2003-07-01), Franzen et al.
patent: 2003/0042415 (2003-03-01), Hager
patent: 197 09 172 (1998-09-01), None
patent: 2 280 781 (1995-02-01), None
patent: 2 364 821 (2002-02-01), None
patent: 2406434 (2005-03-01), None
patent: 03019614 (2003-03-01), None
patent: WO 2004/068523 (2004-08-01), None
patent: WO 2006/014284 (2006-02-01), None
Jeffries,J.B., et al., “Theory of Space-Charge Shift of Ion Cyclotron Resonance Frequencies”, International Journal of Mass Spectrometry and Ion Processes, 1983, pp. 169-187, Issue 54, Elsevier Science Publishers B.V., The Netherlands.

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