Etching a substrate: processes – Nongaseous phase etching of substrate – Recycling – regenerating – or rejunevating etchant
Patent
1995-01-31
1996-06-11
Kunemund, Robert
Etching a substrate: processes
Nongaseous phase etching of substrate
Recycling, regenerating, or rejunevating etchant
1566421, C23F 146
Patent
active
055247806
ABSTRACT:
A method of improved control of recycle of ammoniacal copper etchant which uses metallic aluminum to remove copper without substantially adding undesirable byproducts. The very rapid reaction can be controlled by using a diluent of copper-free etchant, eliminating overheating. The separated copper and aluminum hydroxide sludge are easily filtered from the etchant. The purified etchant is now suitable for chemical adjustment and reuse.
REFERENCES:
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patent: 4058431 (1977-11-01), Haas
patent: 4082546 (1978-04-01), Wallace
patent: 4280887 (1981-07-01), Konstantouros
patent: 5472618 (1995-12-01), Bolser
Won, C. W. et al. Metall. Trans. B 24B(1) pp. 192-197.
Krulik Gerald A.
Mandich Nenad V.
Singh Rajwant
Alanko Anita
Applied Electroless Concepts Inc.
Kunemund Robert
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