Control of plasma transitions in sputter processing systems

Details Control of plasma transitions in sputter processing systems Control of plasma transitions in sputter processing systems

2005-11-22

2005-11-22

Walberg, Teresa J. (Department: 3753)

Electric heating

Metal heating

By arc

C219S121570, C219S121360, C219S121430, C204S192120

Reexamination Certificate

active

06967305

ABSTRACT:
Methods and apparatus for controlling a plasma used for materials processing feature cooperative action of a resonant circuit and a switch unit coupled to a plasma vessel and a power supply. A sensor for acquiring a signal associated with a state of a plasma in the plasma vessel supports closed-loop control of the switch unit. Undesirable plasma states detected by the sensor can be eliminated by closing the switch unit to shunt the resonant circuit.

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