Control of particles on semiconductor wafers when implanting...

Details Control of particles on semiconductor wafers when implanting... Control of particles on semiconductor wafers when implanting...

2011-08-09

2011-08-09

Johnston, Phillip A (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S42300F, C134S021000

Reexamination Certificate

active

07994487

ABSTRACT:
A method for reducing particle contamination during implantation of ions comprises providing an implantation system for implanting ions into a workpiece via an ion beam, wherein one or more components are under selective vacuum and have one or more contaminants in a first state disposed thereon. A gas is introduced to the implantation system, wherein the gas generally reacts with at least a portion of the one or more contaminants, therein transforming the at least a portion of the one or more contaminants into a second state The at least a portion of the one or more contaminants in the second state remain disposed on the one or more components, and wherein the at least a portion of the second state of the one or more contaminants generally does not produce particle contamination on the one or more workpieces.

REFERENCES:
patent: 4512812 (1985-04-01), Liebert et al.
patent: 5554854 (1996-09-01), Blake
patent: 5814819 (1998-09-01), Sinclair et al.
patent: 6013332 (2000-01-01), Goto et al.
patent: 6221169 (2001-04-01), Bernstein et al.
patent: 6958481 (2005-10-01), Horsky et al.
patent: 6992311 (2006-01-01), Ring et al.
patent: 7060995 (2006-06-01), Bresolin et al.
patent: 2006/0086376 (2006-04-01), Dimeo et al.

Affiliated with

Also associated with

Rating

Control of particles on semiconductor wafers when implanting... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Control of particles on semiconductor wafers when implanting..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Control of particles on semiconductor wafers when implanting... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2655798