Control of overlay registration

Details Control of overlay registration Control of overlay registration

2006-08-08

2006-08-08

Frejd, Russell (Department: 2128)

Data processing: structural design, modeling, simulation, and em

Modeling by mathematical expression

C716S030000, C716S030000, C700S121000

Reexamination Certificate

active

07089164

ABSTRACT:
A system and method are disclosed for controlling a registration overlay. The method comprises estimating a state using moving horizon estimation and determining an input of the registration overlay using the state. The system comprises an estimator configured to determine a state using moving horizon estimation; and a regulator configured to determine an input of the registration overlay using the state.

REFERENCES:
patent: 4551015 (1985-11-01), Goemans
patent: 5968607 (1999-10-01), Lovison
Abughazaleh et al., S.A. Null holographic test structures for the measurement of overlay and its statistical vrariation, IEEE Transactions on Semiconductor Manufacturing, vol. 13, No. 2, May 2000, pp. 173-180.
Middlebrooks, Scott A., “Optimal Model-Predictive Control of Overlay Lithography Implemented in an ASIC Fab” Proceedings of SPIE, Microlithography 2003, 5044-2.
Muske, Kenneth Robert, “Linear Model Predictive Control of Chemical Processes” University of Texas at Austin, May 1995.

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