Control of impurities in toroidal plasma devices

Details Control of impurities in toroidal plasma devices Control of impurities in toroidal plasma devices

1975-08-29

1980-12-16

Bentley, Stephen C.

176 3, G21B 100

Patent

active

042395941

ABSTRACT:
A method and apparatus for plasma impurity control in closed flux plasma systems such as Tokamak reactors is disclosed. Local axisymmetrical injection of hydrogen gas is employed to reverse the normally inward flow of impurities into the plasma.

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