Control of deposition of thin films

Details Control of deposition of thin films Control of deposition of thin films

1980-04-18

1982-01-19

Hoffman, James R.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

118664, 118665, 204192R, 204298, G05D 503, C23C 1308, C23C 1500, G01B 706

Patent

active

043117252

ABSTRACT:
In apparatus for sensing and controlling the deposition of a thin film on to a substrate (12) from a gas or vapor phase, the optical reflectance or transmittance is sensed, the resonant frequency of a crystal (14) also exposed to the deposition is sensed, and the quotient of the change in each signal over a predetermined time interval is determined. The deposition can be terminated at a suitable thickness, for example a reflectance or transmittance maximum or minimum. Instead of an optical property, the electrical resistivity of the film may be sensed and used in the same way.

REFERENCES:
patent: 3400687 (1968-09-01), Lueck
Lue, "An Optimum Thickness Indicator for Evaporating Metals on Schottky Barrier Solar Cells", Journal of Physics E: Scientific Instruments, vol. 11, Jan. 1978, pp. 84-86.
Putner, "The Vacuum Deposition of Metaloxide Films by Automatic Control", Optics and Laser Technology, vol. 4, No. 2, Apr. 1972, pp. 79-86.
Leybold-Heraeus, "Optical Monitoring of the Production of Thin Films in Vacuum" undated.
Vidal et al., "Optical Monitoring of Nonquarterwave Multilayer Filters", Applied Optics, vol. 17, Apr. 1, 1978, pp. 1038-1047.

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