Control of deposition and other processes

Metal founding – Means to shape metallic material

Reexamination Certificate

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Details

C164S046000, C164S004100, C427S345000, C118S314000

Reexamination Certificate

active

10469738

ABSTRACT:
Material is incrementally deposited using material directed toward a deposition zone. The scan path of the directed material is controlled according to a path plan derived to reduce derivation from an ideal uniform temperature profile for the deposition during the deposition process. A path plan having angled scan passes that intersect (or overcross one another), for example in a mirrorbox path plan, is preferred.

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patent: WO 00/11234 (2000-03-01), None
patent: WO 02/36845 (2002-05-01), None

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