Control of critical dimensions through measurement of absorbed r

Details Control of critical dimensions through measurement of absorbed r Control of critical dimensions through measurement of absorbed r

1997-06-23

2000-05-16

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

G03F 900

Patent

active

060635304

ABSTRACT:
A lithographic system with improved control of critical dimensions (CD). The lithographic system includes a detector for determining the amount of energy absorbed by the photoresist. This enables the lithographic system to expose each field with the required exposure dose, thus reducing variations in CD.

REFERENCES:
patent: 5124216 (1992-06-01), Giapis et al.
patent: 5674652 (1997-10-01), Bishop et al.

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