Control method for a substrate processing apparatus

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C700S009000, C700S104000, C700S108000, C700S169000, C700S174000, C702S182000, C702S183000, C702S184000, C340S003100, C340S003430, C340S003900

Reexamination Certificate

active

07930049

ABSTRACT:
A centralized control apparatus includes a data collecting part that gathers data at a predetermined interval from a substrate processing apparatus for each component in the substrate processing apparatus; a data processing part that determines a status of each component based on the gathered data and regulation control information including attribute information about each component, maintenance information and previously established status-determined information about each component, at a predetermined timing established for each component, and performs thinning-out-processing to the gathered data on a determination result and prepares processed data by processing data obtained by the thinning-out-processing; and a data transmitting part that sends the regulation control information including the determination result and the processed data to a terminal unit.

REFERENCES:
patent: 7292909 (2007-11-01), Inada et al.
patent: 7462011 (2008-12-01), Yamazaki et al.
patent: 7524378 (2009-04-01), Mori
patent: 7702413 (2010-04-01), Ushiku et al.
patent: 2002/0026251 (2002-02-01), Johnson et al.
patent: 2003/0147643 (2003-08-01), Miyata et al.
patent: 2005/0095774 (2005-05-01), Ushiku et al.
patent: 2005/0105991 (2005-05-01), Hofmeister et al.
patent: 2005/0216114 (2005-09-01), Hsiung et al.
patent: 2006/0073654 (2006-04-01), Mori
patent: 2006/0215338 (2006-09-01), Yokouchi et al.
patent: 2006/0246683 (2006-11-01), Pan et al.
patent: 2007/0076942 (2007-04-01), Yatsugake et al.
patent: 2007/0131253 (2007-06-01), Nakamura et al.
patent: 2007/0183871 (2007-08-01), Hofmeister et al.
patent: A-10-039920 (1998-02-01), None
patent: A-10-227400 (1998-08-01), None
patent: A-2002-110498 (2002-04-01), None
patent: A-2002-312021 (2002-10-01), None
patent: A-2003-015734 (2003-01-01), None
patent: A-2004-227357 (2004-08-01), None
patent: WO 2004/083977 (2004-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Control method for a substrate processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Control method for a substrate processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Control method for a substrate processing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2678891

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.