Control device of the position and slope of a target

Optics: measuring and testing – By alignment in lateral direction

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Details

250548, G01B 1100, G01N 2186

Patent

active

057423970

ABSTRACT:
The present invention relates generally to a control device for controlling the position and slope of a target, and more particularly, to a control device to keep the position and slope of a target, such as a wafer or a substrate, within limits of a focus-depth of a projection lens.
The control device comprises a light source that emits light to be transmitted to and reflected from the target; a first mask through which the light emitted from the light source passes, and on which an asymmetric pattern is recorded; first and second photoreceivers for detecting the light reflected from the target; and control device for adjusting the position and slope of the target based on signals received from the photoreceiver.

REFERENCES:
patent: 3588738 (1971-06-01), Goodwin
patent: 3609588 (1971-09-01), McKnight
patent: 3747019 (1973-07-01), Koechner
patent: 4114180 (1978-09-01), Kayanuma
patent: 4902900 (1990-02-01), Kamiya
patent: 4999669 (1991-03-01), Sakamoto
patent: 5114236 (1992-05-01), Matsugu
patent: 5216235 (1993-06-01), Lin
patent: 5414515 (1995-05-01), Kawashima
patent: 5461237 (1995-10-01), Wakamoto

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