Contoured CMP pad dresser and associated methods

Details Contoured CMP pad dresser and associated methods Contoured CMP pad dresser and associated methods

2007-04-10

2007-04-10

Wilson, Lee D. (Department: 3723)

Abrading

Accessory

Dressing

C451S041000, C451S056000, C451S285000

Reexamination Certificate

active

10954956

ABSTRACT:
CMP pad dressers with increased pad dressing work loads on the centrally located abrasive particles during dressing of a CMP pad, and methods associated therewith are disclosed and described. The increase in work load on centralized particles improves pad dressing performance and also extends the service life of the pad dresser.

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Yasunaga, N. et al. (2000) Advances in Abrasive Technology, III Soc. Of Grinding Engineers (SGE) in Japan.

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