Continuous vapor deposition method for producing a coated glass

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428336, 428337, 428341, 428420, 428428, 428448, 428913, 428333, C03C 1500

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active

048350400

ABSTRACT:
A continuous, chemical vapor deposition method for producing a coated glass article is disclosed. A glass substrate is advanced continuously, while hot, past first and second treating stations. A non-oxidizing atmosphere is maintained in the vicinity of the first treating station, while an oxidizing atmosphere is maintained in the vicinity of the second station. A non-oxidizing gas which contains a silane, e.g., SiH.sub.4, is directed from the first treating station against a surface of the glass to form a silicon coating on that surface. An oxidizing gas which includes a metal compound in the vapor phase is directed from the second station against the silicon-coated surface of the article. The process is controlled so that the silane-containing gas forms a reflective silicon coating on the glass surface, the oxidizing gas which includes a metal compound forms a coating of an oxide of the metal, and oxidation before the article reaches the second treating station forms a silicon oxide layer on the silicon which is of sufficient thickness that the metal oxide layer is substantially free of pinholing.

REFERENCES:
patent: 4100330 (1978-07-01), Donley
patent: 4636439 (1987-01-01), Breininger

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