Continuous vapor deposition method for producing a coated glass

Details Continuous vapor deposition method for producing a coated glass Continuous vapor deposition method for producing a coated glass

1985-10-07

1987-04-28

Childs, Sadie L.

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

427166, 427167, 4272553, 4272557, C23C 1624, C23C 1640

Patent

active

046613811

ABSTRACT:
A continuous, chemical vapor deposition method for producing a coated glass article is disclosed. A glass substrate is advanced continuously, while hot, past first and second treating stations. A non-oxidizing atmosphere is maintained in the vicinity of the first treating station, while an oxidizing atmosphere is maintained in the vicinity of the second station. A non-oxidizing gas which contains a silane, e.g., SiH.sub.4, is directed from the first treating station against a surface of the glass to form a silicon coating on that surface. An oxidizing gas which includes a metal compound in the vapor phase is directed from the second station against the silicon-coated surface of the article. The process is controlled so that the silane-containing gas forms a reflective silicon coating on the glass surface, the oxidizing gas which includes a metal compound forms a coating of an oxide of the metal, and oxidation before the article reaches the second treating station forms a silicon oxide layer on the silicon which is of sufficient thickness that the metal oxide layer is substantially free of pinholing.

REFERENCES:
patent: 3374141 (1968-03-01), Junge et al.
patent: 4019887 (1977-04-01), Kirkbride et al.
patent: 4100330 (1978-07-01), Donley
patent: 4187336 (1980-02-01), Gordon
patent: 4188444 (1980-02-01), Landau
patent: 4188452 (1980-02-01), Groth
patent: 4206252 (1980-06-01), Gordon

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