Continuous vapor deposition apparatus

Details Continuous vapor deposition apparatus Continuous vapor deposition apparatus

1996-10-10

1999-06-01

Bueker, Richard

Coating apparatus

Condition responsive control

118712, 118719, 427 8, 427 10, 4272555, 4272556, 4272557, C23C 1600

Patent

active

059085061

ABSTRACT:
Continuous vapor deposition apparatus for coating objects with a coating material, e.g., parylene, are disclosed. The apparatus comprise an entrance chamber for loading the objects, a process chamber for coating the objects, and an exit chamber for removing the objects. Coating material is introduced into the process chamber under vacuum conditions in a vaporized state. The pressure in the process chamber can be controlled by modulating the rate of introduction of the coating material with a modulating valve in response to the pressure in the process chamber. A process for continuously coating objects by vapor deposition under vacuum conditions, suitable for use in the apparatus, is also disclosed.

REFERENCES:
patent: 3211128 (1965-10-01), Potter et al.
patent: 3246627 (1966-04-01), Loeb et al.
patent: 3301707 (1967-01-01), Loeb et al.
patent: 3472795 (1969-10-01), Tittmann
patent: 3554512 (1971-01-01), Elliott
patent: 3570449 (1971-03-01), Blecherman
patent: 3573968 (1971-04-01), Loeb
patent: 3600216 (1971-08-01), Stewart
patent: 3667424 (1972-06-01), Cornelius et al.
patent: 3670693 (1972-06-01), Rorick et al.
patent: 3747558 (1973-07-01), Harel
patent: 3749601 (1973-07-01), Tittle
patent: 4047624 (1977-09-01), Dorenbos
patent: 4110392 (1978-08-01), Yamazaki
patent: 4184188 (1980-01-01), Briglia
patent: 4261762 (1981-04-01), King
patent: 4323031 (1982-04-01), Kaplan
patent: 4362125 (1982-12-01), Schadler
patent: 4401052 (1983-08-01), Baron et al.
patent: 4468283 (1984-08-01), Ahmed
patent: 4495889 (1985-01-01), Riley
patent: 4508055 (1985-04-01), Elton et al.
patent: 4518623 (1985-05-01), Riley
patent: 4577465 (1986-03-01), Olsen et al.
patent: 4596208 (1986-06-01), Wolfson et al.
patent: 4613306 (1986-09-01), Bauer et al.
patent: 4619844 (1986-10-01), Pierce et al.
patent: 4683143 (1987-07-01), Riley
patent: 4734533 (1988-03-01), Ungarelli et al.
patent: 4761269 (1988-08-01), Conger et al.
patent: 4783561 (1988-11-01), Pregaglia et al.
patent: 4795838 (1989-01-01), Bornengo et al.
patent: 4816608 (1989-03-01), Bornengo et al.
patent: 4817557 (1989-04-01), Diem
patent: 4846998 (1989-07-01), Phol et al.
patent: 4853488 (1989-08-01), Ungarelli et al.
patent: 4877433 (1989-10-01), Oshitari
patent: 4883020 (1989-11-01), Kasai et al.
patent: 4886923 (1989-12-01), Ungarelli et al.
patent: 4902572 (1990-02-01), Horne et al.
patent: 4903754 (1990-02-01), Hirscher et al.
patent: 4945856 (1990-08-01), Stewart
patent: 4957781 (1990-09-01), Kanegae et al.
patent: 5002011 (1991-03-01), Ohmine et al.
patent: 5007372 (1991-04-01), Hattori et al.
patent: 5015503 (1991-05-01), Varrin, Jr. et al.
patent: 5078091 (1992-01-01), Stewart
patent: 5078851 (1992-01-01), Nishihata et al.
patent: 5079045 (1992-01-01), Luhmann et al.
patent: 5088444 (1992-02-01), Ohmine et al.
patent: 5091207 (1992-02-01), Tanaka
patent: 5112642 (1992-05-01), Wajid
patent: 5121707 (1992-06-01), Kanoo
patent: 5123375 (1992-06-01), Hansen
patent: 5129360 (1992-07-01), Ahern et al.
patent: 5131752 (1992-07-01), Yu
patent: 5151133 (1992-09-01), Ohmine et al.
patent: 5167717 (1992-12-01), Boitnott
patent: 5186120 (1993-02-01), Ohnishi et al.
patent: 5217755 (1993-06-01), Thebault et al.
patent: 5221403 (1993-06-01), Nozawa et al.
patent: 5228501 (1993-07-01), Tepman et al.
patent: 5248370 (1993-09-01), Tsui et al.
patent: 5248380 (1993-09-01), Tanaka
patent: 5250092 (1993-10-01), Nakano
patent: 5250323 (1993-10-01), Miyazaki
patent: 5254171 (1993-10-01), Hayakawa et al.
patent: 5261963 (1993-11-01), Basta et al.
patent: 5262194 (1993-11-01), Bischer, Jr. et al.
patent: 5264039 (1993-11-01), Gobush et al.
patent: 5266118 (1993-11-01), Mitra
patent: 5268033 (1993-12-01), Stewart
patent: 5268202 (1993-12-01), You et al.
patent: 5270266 (1993-12-01), Hirano et al.
patent: 5292554 (1994-03-01), Sinha et al.
patent: 5302767 (1994-04-01), Galley et al.
patent: 5324540 (1994-06-01), Terada
patent: 5344492 (1994-09-01), Sato et al.
patent: 5350453 (1994-09-01), Schlosser
patent: 5401316 (1995-03-01), Shiraishi et al.
patent: 5439525 (1995-08-01), Peichl et al.
patent: 5447799 (1995-09-01), Loh et al.
patent: 5458687 (1995-10-01), Shichida et al.
patent: 5534068 (1996-07-01), Beach et al.
L. You, et al., Chemical Perspectives of Microelectric Materials III Symposium (1992) (Abstract Only).
Chow, S.W., "Poly (.alpha.,.alpha.,.alpha.',.alpha.',-tetrafluoro-p-xylylene)", Journal of Applied Polymer Science, vol. 13, pp. 2325-2332, 1969.
Mikami Takashi, "Quartz Crystal Oscillator Type Radical Beam Monitor", Patent Abstracts of Japan, Patent No 07050258.
International Search Report.

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