Continuous sloped phase edge architecture fabrication...

Details Continuous sloped phase edge architecture fabrication... Continuous sloped phase edge architecture fabrication...

2007-10-16

2007-10-16

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10808063

ABSTRACT:
A phase shift mask may include boundaries between phase shift regions with continuous sloped phase edges. The continuous sloped phase edges may be produced by introducing a predetermined degree of defocus into a beam used during production of the mask to image the pattern on the mask. Such a phase shift mask may be “trimless”, i.e., not require a corresponding binary “trim” mask for a second exposure to remove phase conflicts after exposure with the phase shift mask.

REFERENCES:
patent: 5300377 (1994-04-01), Keum
patent: 6228745 (2001-05-01), Wheeler et al.
patent: 6436590 (2002-08-01), Wang et al.
patent: 6534225 (2003-03-01), Flanders et al.
patent: 6780568 (2004-08-01), Nistler et al.
Wang et al., “Polarized Phase Shift Mask: Concept, Design, and Potential Advantages to Photolithography Process and Physical Design”, Proceedings of the SPIE; The International Society for Optical Engineering Conference; vol. 4562, pp. 406-417, 2002.
Pfau et al., “Gradient Phase-Shifter Transitions Fabricated by Ion Milling”, SPIE, vol. 1674 Optical/Laser Microlithography V, pp. 585-593, 1992.

Affiliated with

Also associated with

Rating

Continuous sloped phase edge architecture fabrication... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Continuous sloped phase edge architecture fabrication..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous sloped phase edge architecture fabrication... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3883679