Continuous semiconductor substrate processing system

Details Continuous semiconductor substrate processing system Continuous semiconductor substrate processing system

1989-09-06

1991-06-18

Spar, Robert J.

Material or article handling

Apparatus for charging a load holding or supporting element...

With simultaneous charging and discharging of plural load...

414273, 414286, 901 7, B65H 8500

Patent

active

050245708

ABSTRACT:
A continuous semiconductor substrate processing system is operated by a system control structure in accordance with a predetermined processing program. A wafer conveying mechanism conveys wafers to and from each of plural process stations, each of which performs a corresponding process step on semiconductor wafers, to and from a stocker and to and from an inspection unit. Carriers, movable by manual or mechanical structure other than the wafer conveying mechanism, provide for alternative conveying of wafers to and from each of the process stations, the stocker and the inspection station. The system control structure monitors and selectively controls each of the wafer conveying mechanism, the process stations and the stocker and issues instructions for movement of the carriers and monitors the positioning of carriers for selective control of the transfer of wafers and the priority sequence of processing of wafers, to maintain continuous performance of plural process steps on plural lots of semiconductor wafers.

REFERENCES:
patent: 4695215 (1987-09-01), Jacoby et al.
patent: 4722653 (1988-02-01), Williams et al.
patent: 4764078 (1988-08-01), Neri
patent: 4870590 (1989-09-01), Kawata et al.

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