Optics: measuring and testing – By dispersed light spectroscopy – With sample excitation
Patent
1993-10-22
1995-12-26
McGraw, Vincent P.
Optics: measuring and testing
By dispersed light spectroscopy
With sample excitation
333 99PL, G01J 330, H01P 100, G01N 2169
Patent
active
054792541
ABSTRACT:
Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury.
REFERENCES:
patent: 4933650 (1990-06-01), Okamoto
patent: 4965540 (1990-10-01), Sullivan
patent: 5211142 (1993-05-01), Matthews et al.
patent: 5262610 (1993-11-01), Huang et al.
patent: 5270616 (1993-12-01), Itatani
Goode et al, "A Review of Instrumentation Used to Generate Microwave-Induced Plasmas," Applied Spectroscopy, vol. 38, No. 6, Nov.-Dec./1984.
Beenakker et al, "An Assessment of a Microwave-Induced Plasma . . . Solutions," Spectrochimica Acta, vol. 33, 1978.
M. W. Blades et al., "Application of Weakly Ionized Plasmas for Materials Sampling and Analysis", IEEE Trans. on Plasma Sci., vol. 19, pp. 1090-1113, 1991.
F. C. Fehsenfeld, et al., "Microwave Discharge Cavities Operating at 2450 MHz", Rev. of Sci. Instrm., vol. 36, pp. 294-298, 1965.
H. Matusiewicz, "A Novel Microwave Plasma Cavity Assembly for Atomic Emission Spectrometry", Spectrachimica Acta. vol. 47B, pp. 1221-1227, 1992.
Y. Okamoto, "Annular-Shaped Microwave-Induced Nitrogen Plasma at Atmospheric Pressure for Emission Spectrometry of Solutions", Analytical Sciences, vol. 7, pp. 283-288, 1991.
D. K. Smith and D. L. Smatlak, "Microwave Atmospheric Pressure Plasma Torch, Characteristics and Application", 27th Microwave Symposium, Washington, D.C., Aug. 2-5, 1992.
K. A. Forbes et al., "Comparison of Microwave-Induced Plasma Sources", J. of Analytical Atomic Spectrometry, vol. 6, pp. 57-71, 1991.
J. P. Matousek et al., "Microwave-Induced Plasmas: Implementation and Application", Prog. Analyt. Atom. Spectrosc., vol. 7, pp. 275-314, 1984.
S. R. Goode and K. W. Baughman, "A Review of Instrumentation Used to Generate Microwave-Induced Plasmas", Applied Spectrosc., vol. 38, pp. 755-763, 1984.
A. T. Zander and G. M. Hieftje, "Microwave-Supported Discharges", Applied Spectrosc., vol. 35, pp. 357-371, 1981.
T. Ishizuka and Y. Uwamino, "Atomic Emission Spectrometry of Solid Samples with Laser Vaporization-Microwave Induced Plasma System", Anal. Chem., vol. 52, pp. 125-129, 1980.
Bacharach Instrument Co. (Pittsburgh, Pa.), produce description for "J-W Mercury Vapor Sniffer", no date.
Pacific Northwest Laboratory, Technology Brief for "Spectrochemical Emission Sensor".
Barnes et al, "Design Concepts for Stripline Microwave Spectro Chemical Sources," Anal. Chem. vol. 62, No. 23, Dec. 1, 1990, pp. 2650-2654.
Demirgian, "Continous Emission Monitor For Incinerators," U.S. Depart. of Energy Info. Exchange Meeting on the Characterization, Monitoring and Sensor Technologies, Dallas, Texas Jun. 3-4, 1992.
Cohn Daniel R.
Smatlak Donna L.
Surma Jeffrey E.
Titus Charles H.
Wittle J. Kenneth
Hantis K. P.
McGraw Vincent P.
LandOfFree
Continuous, real time microwave plasma element sensor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Continuous, real time microwave plasma element sensor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous, real time microwave plasma element sensor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1372808