Continuous purification of an off-gas composed of CO.sub.2 +HCl+

Details Continuous purification of an off-gas composed of CO.sub.2 +HCl+ Continuous purification of an off-gas composed of CO.sub.2 +HCl+

1992-09-10

1995-02-21

Fuller, Benjamin R.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Halogenous component

423481, 422168, C01B 700

Patent

active

053913639

ABSTRACT:
A continuous process for purifying an off-gas which contains CO.sub.2 and HCl and COCl.sub.2. The process comprises passing the off-gas through a separator filled with N,N-dialkylformamide and HCl. This causes a reaction between the COCl.sub.2 and the N,N-dialkylformamide to give the Vilsmeier complex (adduct of COCl.sub.2 and dialkylformamide) and CO.sub.2. The CO.sub.2 leaving the separator contains small amounts of HCl.

REFERENCES:
patent: 3798875 (1974-03-01), Morris
patent: 4230681 (1980-10-01), Coenen et al.
patent: 5200163 (1993-04-01), Henkelmann et al.

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