Continuous production of synthetic silica doped with fluorine

Details Continuous production of synthetic silica doped with fluorine Continuous production of synthetic silica doped with fluorine

1979-07-18

1980-09-09

McCarthy, Helen M.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

65 3A, 65 13, 65 60D, 106 50, 106 52, 350 9631, 350 9634, 423337, 427163, 427167, C03C 1702, C03C 2502, G02B 110

Patent

active

042218250

ABSTRACT:
The present invention relates to a process for the continuous manufacture of vitreous synthetic silica doped with fluorine. This process consists of decomposing a silicon compound free of hydrogen in the flame of an inductive plasma burner, thereby forming silica upon reacting with the oxygen contained in the burner feed gas. A gaseous inorganic fluorine compound free of hydrogen, is sent into the flame preferably from outside the burner. Said fluorine compound simultaneously with the silicon compound decomposes whereby fluorine is introduced into the silica, lowering its index of refraction. The doped silica is then deposited on a heat-stable support in the form of a vitreous mass. The doped synthetic silica is particularly useful for making preforms for optical transmission fibers.

REFERENCES:
patent: 3275408 (1966-09-01), Winterburn
patent: 4045198 (1977-08-01), Rau et al.
patent: 4082420 (1978-04-01), Shiraishi et al.
patent: 4125389 (1978-11-01), King
patent: 4135901 (1979-01-01), Fujiwara et al.
patent: 4161505 (1979-07-01), Shiraishi et al.
patent: 4162908 (1979-07-01), Rau et al.
patent: 4165915 (1979-08-01), Rau et al.
Nassau, K. et al. "Lowloss Fused Silica Made by the Plasma Torch" Applied Optics-13(4) Apr. 1974.

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