Chemistry of inorganic compounds – Carbon or compound thereof – Elemental carbon
Reexamination Certificate
2004-06-10
2010-02-23
Hendrickson, Stuart (Department: 1793)
Chemistry of inorganic compounds
Carbon or compound thereof
Elemental carbon
C423S44500R, C977S844000
Reexamination Certificate
active
07666381
ABSTRACT:
High-power inductively coupled plasma technology is used for thermal cracking and vaporization of continuously fed carbonaceous materials into elemental carbon, for reaction with separate and continuously fed metal catalysts inside a gas-phase high-temperature reactor system operating at or slightly below atmospheric pressures. In one particularly preferred embodiment, in-flight growth of carbon nanomaterials is initiated, continued, and controlled at high flow rates, enabling continuous collection and product removal via gas/solid filtration and separation methods, and/or liquid spray filtration and solid collection methods suitable for producing industrial-scale production quantities. In another embodiment, the reaction chamber and/or filtration/separation media include non-catalytic or catalytic metals to simultaneously or separately induce on-substrate synthesis and growth of carbon nanomaterials. The on-substrate grown carbon nanomaterials are produced in secondary chambers that are selectively isolated for periodic removal of the product.
REFERENCES:
patent: 4663230 (1987-05-01), Tennent
patent: 4990740 (1991-02-01), Meyer
patent: 5578543 (1996-11-01), Tennent et al.
patent: 5611947 (1997-03-01), Vavruska
patent: 5707916 (1998-01-01), Snyder et al.
patent: 5876684 (1999-03-01), Withers et al.
patent: 6153852 (2000-11-01), Blutke et al.
patent: 6331209 (2001-12-01), Jang et al.
patent: 6333016 (2001-12-01), Resasco et al.
patent: 6444864 (2002-09-01), Knight et al.
patent: 6759025 (2004-07-01), Hong et al.
patent: 6855301 (2005-02-01), Rich et al.
Delzeit et al., ‘Growth of Multiwall Carbon Nanotubes in Inductively Coupled Plasma Reactor’ in J. Appl. Phys. vol. 91 #9 pp. 6027-6033, May 1, 2002.
Bronikowski, Michael J.; Willis, Peter A.; Colbert, Daniel T.; Smith, K.A.; and Smalley, Richard E. “Gas-phase production of carbon single-walled nanotubes from carbon monoxide via the HiPco process: A parametric study.”J. Vac. Sci. Technol. A19(4), Jul./Aug. 2001, pp. 1800-1805.
Thess, A.; Lee, R.; Nikolaev, P.; Dai H.; Petit, P.; Robert, J.; Xu, C.; Lee, Y.H.; Kim, S.G.; Rinzler, A.G.; Colbert, D.T.; Scuseria, G.E.; Tomanek, D.; Fischer, J.E.; and Smalley, R.E. “Crystalline Ropes of Metallic Carbon Nanotubes,”ScienceJul. 26, 1996; 273(5274):483-7. (Abstract, 1pg.).
Odom, Teri Wang; Huang, Jin-Lin; Kim, Philip; and Lieber, Charles M. “Atomic structure and electronic properties of single-walled carbon nanotubes.”Nature. 391, 62-64 (Jan. 1, 1998); doi:10.1038/34145. © Macmillan Publishers Ltd. 1998 Registered No. 785998 England. 1 pg.
Qin, L.C.; Zhou, D.; Krauss, A.R.; and Gruen, D.M. “Growing carbon nanotubes by microwave plasma-enhanced chemical vapor deposition.”Applied Physics Letters, vol. 72, No. 26, Jun. 29, 1998, pp. 3437-3439.
Smiljanic, O.; Larouche, F.; Stansfield, B.L.; Dodelet, J.P., and Sun, X. “Gas phase synthesis of SWNT by a continuous and scalable plasma based process.” Abstract submitted to the Nanotube'02 Workshop. Last modified Jun. 21, 2002. Available http://dielc/kaist.ac.kr
t02/abstracts/P109.shtml. 1 pg.
Zheng, B.; Li, Y.; and Liu, J. “CVD synthesis and purification of single-walled carbon nanotubes on aerogel-supported catalyst.”Applied Physics A, 74, 345-348 (2002). pp. 345-348.
Blutke Andreas
Ferguson Robert
Henderson Mark
Vavruska John
Anderson Ronald M.
Hendrickson Stuart
Plasmet Corporation
LandOfFree
Continuous production of carbon nanomaterials using a high... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Continuous production of carbon nanomaterials using a high..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous production of carbon nanomaterials using a high... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4235291