Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including heat exchanger for reaction chamber or reactants...
Reexamination Certificate
2011-08-23
2011-08-23
Griffin, Walter D (Department: 1774)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Including heat exchanger for reaction chamber or reactants...
C422S129000, C422S202000, C422S203000, C422S146000, C422S149000, C422S224000
Reexamination Certificate
active
08003059
ABSTRACT:
A system having a reactor for continuous processing of fluid is provided herein. The reactor, in general, includes an outer vessel to accommodate fluids to be processed or used in connection therewith, an inner vessel situated within the outer vessel to serve as an energy exchange surface, and an annular space defined between the outer and inner vessels and along which processing of the fluids can be implemented. The continuous thin film reactor can be used to perform, for example, distillation and evaporation, fluid-fluid or solid-fluid-fluid reactions, organic reactions, cooling, and desalination.
REFERENCES:
patent: 4311570 (1982-01-01), Cowen et al.
patent: 5855680 (1999-01-01), Soininen et al.
patent: 7122149 (2006-10-01), Li et al.
patent: 7531096 (2009-05-01), Yarbrough et al.
patent: 7708952 (2010-05-01), Chen et al.
patent: 2007/0125719 (2007-06-01), Yarbrough et al.
International Search Report based on PCT/US10/35128 mailed Jul. 12, 2010.
Jachuck Roshan J. J.
Jachuck Supriya
Greenberg & Traurig, LLP
Griffin Walter D
Pham Chinh H.
R3 Fusion, Inc.
Young Natasha
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