Continuous process for preparing particulate microporous, open-c

Plastic and nonmetallic article shaping or treating: processes – Formation of solid particulate material directly from molten...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

260 25M, 264 9, 264 28, 264 41, 264 49, 264DIG5, 264DIG13, B29D 2700

Patent

active

040411150

ABSTRACT:
A continuous process for preparing particulate microporous, open-celled polymer structures in a co-rotating twin-screw processor comprising agitating normally solid organic polymer and chlorofluorocarbon in the melt zone of said processor, cooling the resulting solution under agitation in the cooling and milling zone, extruding a snow-like mass from the cooling and milling zone, and then removing the chlorofluorocarbon from the snow-like mass to leave the polymer structures.

REFERENCES:
patent: 3308211 (1967-03-01), Plastridge
patent: 3462337 (1969-08-01), Gorton
patent: 3468986 (1969-09-01), Watanabe
patent: 3752784 (1973-08-01), Jenkins
patent: 3753932 (1973-08-01), Jenkins
patent: 3812224 (1974-05-01), Smith et al.
patent: 3936517 (1976-02-01), Thomas
Natta, Giulio "Progress in Five Years of Research in Stereospecific Polymerization," in SPE Journal, May 1959, pp. 373-382.
Brandrup, J. and E. H. Immergut, Editors, "Polymer Handbook," New York, Interscience, c1966, pp. III-33, 34, 37, 39, 42, 46, 48, 51, 52, 57, 64, 65, 68, 71, 72, 74, 85, 86, 87, 88.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Continuous process for preparing particulate microporous, open-c does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Continuous process for preparing particulate microporous, open-c, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous process for preparing particulate microporous, open-c will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1228275

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.