Continuous multigate transistors

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor

Reexamination Certificate

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C257S365000, C257SE29264

Reexamination Certificate

active

07635881

ABSTRACT:
An N doped area neighboring to a P doped area on a semiconductor material, function respectively as a first gate and a second gate for transistors. A dielectric layer is made under the gates. A source and a drain are made under and near two sides of the dielectric layer, electrically coupled to the gate to form continuous multigate transistors.

REFERENCES:
patent: 6747328 (2004-06-01), Wu
patent: 2008/0128767 (2008-06-01), Adkisson et al.

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