Continuous method for separating a C 4 cut

Details Continuous method for separating a C 4 cut Continuous method for separating a C 4 cut

2003-07-22

2008-12-09

Caldarola, Glenn (Department: 1797)

Mineral oils: processes and products

Chemical conversion of hydrocarbons

Cracking

C585S258000, C585S259000, C585S324000, C585S664000, C585S668000, C585S671000, C585S833000, C585S864000

Reexamination Certificate

active

07462277

ABSTRACT:
In a continuous process for fractionating a C4fraction (C4) by extractive distillation using a selective solvent (LM) in an extractive distillation column (EDK), it is proposed that a dividing wall (TW) is installed in the longitudinal direction in the extractive distillation column (EDK) to form a first region (A), a second region (B) and a lower combined column region (C) and a top stream (C4H10) comprising the butanes is taken off from the first region (A), a top stream (C4H8) comprising the butenes is taken off from the second region (B) and a stream (C4H6) comprising the hydrocarbons from the C4fraction which are more soluble in the selective solvent (LM) than are the butanes and the butenes is taken off from the lower combined column region (C).

REFERENCES:
patent: 5563299 (1996-10-01), Paludetto et al.
patent: 6137023 (2000-10-01), Dorbon et al.
patent: 2002/0087040 (2002-07-01), Marchionna et al.
patent: 2003/0181772 (2003-09-01), Meyer et al.
patent: 198 18 810 (1999-10-01), None
patent: 100 22 465 (2001-11-01), None
patent: 101 05 660 (2002-08-01), None
patent: 102 19 375 (2003-11-01), None
patent: 0 667 329 (1995-08-01), None

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