X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1990-06-15
1991-09-03
Westin, Edward P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 73, 378 81, G01N 2320, G01N 23207
Patent
active
050460773
ABSTRACT:
The invention discloses a method and an apparatus for measuring lattice spacings in particular of a single crystal during the growth thereof by vapor deposition while located in a heating furnace.
REFERENCES:
patent: 3113209 (1963-12-01), Shimula
patent: 3816747 (1974-06-01), Kishino
patent: 4301364 (1981-11-01), Goebel
patent: 4364122 (1982-12-01), Wolfel et al.
patent: 4634490 (1987-01-01), Tatsumi et al.
patent: 4961210 (1990-10-01), Fatemi
Chu Kim-Kwok
Spain Norman N.
U.S. Philips Corporation
Westin Edward P.
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