Continuous ionizer for semiconductor manufacturing processes

Cleaning and liquid contact with solids – Processes – Work handled in bulk or groups

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 18, 261123, 261DIG7, 261 64D, 261 645, B08B 100, B08B 704, B01D 4702, B01D 47100

Patent

active

046734430

ABSTRACT:
A continuous ionizer adapted to introduce selected ions into a continually flowing stream of liquid. To ensure that a maximum concentration of ions is incorporated, the continuous ionizer is configured so that turbulent and intimate mixing of the ionizing gas and liquid to be ionized occurs. The flow of ionizing gas is regulated by a liquid level sensor to prevent a gas/liquid mixture from proceeding downstream from the ionizer. The apparatus and method of this invention are particularly suited to situations where deionized water is used in a process which causes undesired static electricity discharges, and clean, ion-possessing water is preferred, such as semiconductor processing.

REFERENCES:
patent: 659657 (1900-10-01), Felter
patent: 867356 (1907-10-01), Fox
patent: 2326243 (1943-08-01), Meyer
patent: 3083148 (1963-03-01), Mojonnier
patent: 3213016 (1965-10-01), Gowers et al.
patent: 3378339 (1968-04-01), Yamashiki
patent: 3475330 (1969-10-01), Gilles
patent: 3490249 (1970-01-01), Schwertfeger et al.
patent: 3701793 (1972-10-01), Schmidt et al.
patent: 3764014 (1973-10-01), Stern et al.
patent: 4219414 (1980-08-01), Crits
patent: 4329234 (1982-05-01), Cikut et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Continuous ionizer for semiconductor manufacturing processes does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Continuous ionizer for semiconductor manufacturing processes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous ionizer for semiconductor manufacturing processes will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-682094

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.