Continuous in-line deposition system

Details Continuous in-line deposition system Continuous in-line deposition system

1983-10-26

1986-06-10

Smith, John D.

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723, 118724, 118725, 118728, 118729, 118733, 118 501, 118500, C23C 1456

Patent

active

045936447

ABSTRACT:
A continuous, in-line deposition system is disclosed for coating large substrates. The apparatus includes loadlock chambers for loading and unloading substrates arranged in carriers. The carriers transport through the apparatus a plurality of pairs of substrates with their principal faces, that is faces to be coated, held in a plane that is both parallel to the electric field of the glow discharge reaction and perpendicular to the direction of motion of the substrates through the apparatus.

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