Continuous gas saturation system and method

Details Continuous gas saturation system and method Continuous gas saturation system and method

1999-02-18

2000-10-24

Bushey, C. Scott

Gas and liquid contact apparatus

With external supply or removal of heat

Processes

261130, 261136, 261138, 2611221, 261DIG29, B01F 304

Patent

active

061354333

ABSTRACT:
Provided are a system and method for saturating a gas with a vapor from a liquid chemical. The system includes: (a) a saturation vessel connected to receive a liquid chemical and a carrier gas; (b) a gas sparger in the saturation vessel for sparging the carrier gas into the liquid chemical; (c) means for maintaining the liquid chemical in the saturation vessel at a substantially constant level; (d) means for controlling the temperature of the liquid chemical in the saturation vessel to a desired value, comprising (I) a system for cooling the liquid chemical, and (ii) a heater inside the saturation vessel extending vertically in the liquid a distance at least half of the height of the liquid chemical level for heating the liquid chemical; and (e) means for controlling the pressure of the saturated gas to a desired value. The invention also relates to novel methods and systems for controlled delivery of a vaporized liquid chemical. The invention has particular applicability to the semiconductor manufacturing industry.

REFERENCES:
patent: 3987133 (1976-10-01), Andra
patent: 4212663 (1980-07-01), Aslami
patent: 4436674 (1984-03-01), McMenamin
patent: 4626376 (1986-12-01), Pean
patent: 4861524 (1989-08-01), Sielaff et al.
patent: 5078922 (1992-01-01), Collins et al.
patent: 5662838 (1997-09-01), Yamaguchi et al.
patent: 5693189 (1997-12-01), Oguro et al.

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