Continuous flow vapor dryer system

Details Continuous flow vapor dryer system Continuous flow vapor dryer system

1994-03-16

1996-07-30

Bennett, Henry

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34470, 34 76, F26B 2106

Patent

active

055399959

ABSTRACT:
An apparatus and method for rapidly drying an object, such as a semiconductor wafer, by creating a vapor flow from a liquid, such as isopropyl alcohol, and exposing the object to that flow. The apparatus comprises a heater for vaporizing liquid in a reservoir into a vapor, a condenser for subsequently condensing the vapor, and a treatment chamber into which the object to be dried is placed. The vaporization of the liquid at the reservoir and its subsequent condensation at the condenser creates a pressure gradient between the heater and the condenser, thereby forming a vapor stream. The object to be dried is exposed to this vapor stream, whereby some of the vapor condenses on the object and combines with the liquid on the object to produce a condensate which flows off the object, thereby drying the object. The method comprises the steps of heating a liquid to form a vapor, condensing the vapor to form a vapor stream, and positioning an object to be dried in the vapor stream.

REFERENCES:
patent: 4755261 (1988-06-01), McCord
patent: 4838476 (1989-06-01), Rahn
patent: 4841645 (1989-06-01), Bettcher et al.
patent: 4977688 (1990-12-01), Roberson, Jr. et al.
patent: 5054210 (1991-10-01), Schumacher et al.
patent: 5115576 (1992-05-01), Roberson, Jr. et al.
patent: 5371950 (1994-12-01), Schumacher

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