Continuous fabrication of thin film magnetic recording medium wi

Details Continuous fabrication of thin film magnetic recording medium wi Continuous fabrication of thin film magnetic recording medium wi

1995-06-05

1997-10-21

Bareford, Katherine A.

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

427525, 427529, 427531, 427566, 427128, 427585, 4272481, 427251, 4272555, 118718, 118723EB, 118724, C23C 1400, C23C 1404

Patent

active

056794100

ABSTRACT:
A thin film magnetic recording medium is manufactured with vacuum deposition or sputtering technique. One or more reflectors are provided between the substrate and an evaporation source around a path through which evaporated atoms travel onto a substrate. When a thin film is deposited on a substrate, the one or more reflectors are heated above a melting point of an evaporation material to reflect evaporated atoms arriving them. Thus, atoms reflected by the one or more reflectors also contribute to deposition of a thin film as well as evaporated atoms arriving directly from the evaporation source, and deposition efficiency is improved. Such a reflector is also used to limit a boundary or the path through which evaporated atoms travel onto a substrate. Then, a range of incident angles of evaporated atoms onto the substrate is kept the same for a long time on deposition, and characteristics of the thin film are stable.

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patent: 5418059 (1995-05-01), Sugita et al.
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English Language Abstract of Japanese Patent Laid-Open Publication 63-251925 (Oct. 1988).
English Language Abstract of Japanese Patent Laid-Open Publication 63-251928 (Oct. 1988).
English Language Abstract of Japanese Patent Laid-Open Publication 4-328325 (Nov. 1992).

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