Continuous direct-write optical lithography

Details Continuous direct-write optical lithography Continuous direct-write optical lithography

2007-11-13

2007-11-13

Mack, Ricky (Department: 2873)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C359S291000, C359S298000, C355S035000, C355S067000

Reexamination Certificate

active

10941969

ABSTRACT:
An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.

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“New Architecture for Laser Pattern Generators for 130 NM and Beyond,” Ulric Ljungblad, Tor Sandström, Hans Buhre, Peter Dürr, Hubert Lakner, 20th Annual Bacus Symposium on Photomask Technology, Brian J. Grenon, and Giang T. Dao, Editors, Proceedings of the SPIE, vol. 4186, 2001.

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