Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-09-27
2005-09-27
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298250, C118S718000
Reexamination Certificate
active
06949173
ABSTRACT:
A continuous coating system has several treatment chambers (1, 2) that are arranged one after the other in such a way that in each case, a wall (3) of one treatment chamber (1) having a passage (5) contacts a wall (4) in the adjacent treatment chamber (2) that also has a passage (6). One of the passages (5) is provided in a sealing insert (7), which supports itself on the same side with a first support surface (9) on the wall (3) of one treatment chamber (1) and with a second support surface (10) against the wall (4) of the adjacent treatment chamber (2). Between the two support surfaces (9, 10) and the respective walls (3, 4), in each case there is a surrounding gasket (13, 14) against the respective support surface (9, 10) and the wall (3, 4).
REFERENCES:
patent: 4795299 (1989-01-01), Boys et al.
patent: 5110249 (1992-05-01), Norman
patent: 5135635 (1992-08-01), Ikeda
patent: 6302372 (2001-10-01), Sauer et al.
Applied Films GmbH & Co. KG
Needle & Rosenberg PC
Versteeg Steven
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