Continuous coating process

Details Continuous coating process Continuous coating process

2007-07-10

2007-07-10

Nguyen, Nam (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S198000, C204S623000

Reexamination Certificate

active

11158221

ABSTRACT:
A system for coating variable and/or unlimited length parts is provided. The system comprises a process tank, a coating material supply, and an open-ended process tank conveyor is provided. The process tank comprises an entry port, an exit port opposite the entry port, and a process path extending from the entry port to the exit port. The process tank is in communication with the coating material supply. The open-ended process tank conveyor defines a tank conveyor path extending from a receiving end to a dispensing end along at least a portion of the process path, wherein the process tank conveyor defines an open-ended configuration at the receiving end of the tank conveyor and an open-ended configuration at the dispensing end of the tank conveyor.

REFERENCES:
patent: 2829762 (1958-04-01), Oswald
patent: 3658677 (1972-04-01), Landauer
patent: 4401522 (1983-08-01), Buschow et al.
patent: 4501649 (1985-02-01), Furuno et al.
patent: 4568438 (1986-02-01), Lauke
patent: 4659450 (1987-04-01), Lauke
patent: 4663014 (1987-05-01), Bassett et al.
patent: 4976840 (1990-12-01), Hosten
patent: 6139708 (2000-10-01), Nonomura et al.
patent: 6223890 (2001-05-01), Blankemeyer et al.
patent: 6309517 (2001-10-01), Condra et al.
patent: 6342146 (2002-01-01), Velasquez
patent: 6391180 (2002-05-01), Brendel et al.
patent: 2004/0245093 (2004-12-01), Hubei
patent: WO 03/038159 (2003-05-01), None

Affiliated with

Also associated with

Rating

Continuous coating process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Continuous coating process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous coating process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3743585