Coating apparatus – Gas or vapor deposition – Running length work
Patent
1982-01-19
1985-05-28
Newsome, John H.
Coating apparatus
Gas or vapor deposition
Running length work
118719, 118721, 427 39, 427 86, C23C 1700
Patent
active
045193398
ABSTRACT:
The continuous production of solar cells by the glow discharge (plasma) deposition of layers of varying electrical characteristics is achieved by advancing a substrate through a succession of deposition chambers. Each of the chambers is dedicated to a specific material type deposition. The chambers are mutually isolated to avoid the undesired admixture of reaction gases therebetween. Each plasma deposition is carried out in its glow discharge area, chamber, or chambers, with isolation between the plasma regions dedicated to different material types. Masking, mechanical or lithographic, can be employed relative to the substrate to cause the deposition in the desired configuration. After the semiconductor deposition is complete, top contact and anti-reflection layer or layers are deposited, followed by a protective lamination.
REFERENCES:
patent: 2702760 (1955-02-01), Barth
patent: 3012904 (1961-12-01), Baer et al.
patent: 3205855 (1965-09-01), Auly
patent: 3969163 (1976-07-01), Wakefield
patent: 4328258 (1982-05-01), Coleman
Cannella Vincent D.
Izu Masatsugu
Ovshinsky Stanford R.
Newsome John H.
Siskind Marvin S.
Sovonics Solar Systems
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