Contamination prevention in optical system

Details Contamination prevention in optical system Contamination prevention in optical system

2006-06-13

2006-06-13

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S067000

Reexamination Certificate

active

07061573

ABSTRACT:
An exposure apparatus for illuminating a pattern with light from a light source and for exposing a predetermined surface with light from the pattern includes (i) a projection optical system for projecting the pattern onto the predetermined surface, the projection optical system having at least one optical element having optical surfaces, and (ii) a gas supplying device for locally supplying a gas to the at least one optical element. In one aspect, the gas supplying device directly blows the gas toward one of the optical surfaces of the at least one optical element, which is closest to the predetermined surface, from the predetermined surface side.

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Japanese Office Action dated Sep. 1, 2003, and issued on Sep. 3, 2003, in corresponding Japanese patent appln. No. 2000-113505, with partial English translation.

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