Radiant energy – Electron energy analysis
Reexamination Certificate
2007-10-25
2010-12-21
Berman, Jack I (Department: 2881)
Radiant energy
Electron energy analysis
C250S306000
Reexamination Certificate
active
07855362
ABSTRACT:
Electron spectroscopy methods and apparatus are disclosed. A beam of primary electrons is applied to a measurement location on a surface of a sample. A pinning flux of electrons is applied to one or more pinning regions proximate the measurement location. The pinning flux is characterized by a location, size, shape, and electron flux configured such that contaminants preferentially migrate to the pinning region rather than the measurement location. Emissions from the surface resulting from interaction with the primary electrons and the surface of the sample at the measurement location are analyzed.
REFERENCES:
patent: 4134014 (1979-01-01), Neave et al.
patent: 4639301 (1987-01-01), Doherty et al.
patent: 6201240 (2001-03-01), Dotan et al.
patent: 6507029 (2003-01-01), Nishimura et al.
patent: 6627884 (2003-09-01), McCord et al.
patent: 6690010 (2004-02-01), Adler
patent: 7560691 (2009-07-01), Gubbens
patent: 2004/0183132 (2004-09-01), Yamazaki et al.
patent: 2008/0042055 (2008-02-01), Baykut et al.
patent: 2008/0224039 (2008-09-01), Nakamura et al.
patent: 2009/0321634 (2009-12-01), Khursheed
patent: WO 99/35668 (1999-07-01), None
M Jacka et al., “A Fast, Parallel Acquisition, Electron Energy Analyzer: The Hyperbolic Field Analyzer”,Review of Scientific Instrumentsvol. 70, No. 5, May 1999.
Brodie Alan
Nasser-Ghodsi Mehran
Berman Jack I
Isenberg Joshua D.
JDI Patent
KLA-Tencor Technologies Corporation
Smyth Andrew
LandOfFree
Contamination pinning for auger analysis does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Contamination pinning for auger analysis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Contamination pinning for auger analysis will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4211835